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    Electrochemical studies on the stability and corrosion resistance of titanium-based implant materials

    Aziz-Kerrzo, Maan and Conroy, Kenneth G. and Fenelon, Anna M. and Farrell, Sinéad T. and Breslin, Carmel B. (2001) Electrochemical studies on the stability and corrosion resistance of titanium-based implant materials. Biomaterials, 22 (12). pp. 1531-1539. ISSN 0142-9612

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    The corrosion susceptibility of Ti, Ti–6Al–4V and Ti–45Ni was studied in a buffered saline solution using anodic polarisation and electrochemical impedance measurements. Pitting potentials as low as +250 mV(SCE) were recorded for Ti–45Ni and once initiated pits continued to propagate at potentials as low as −150 mV(SCE). It was possible to increase the pitting potential of Ti–45Ni to values greater than +800 mV(SCE) using a H2O2 surface treatment procedure; however, this surface modification process had no beneficial effect on the rate of pit repassivation. Impedance spectra, recorded under open-circuit conditions, were modelled using a dual oxide film model; a porous outer layer and an inner barrier oxide layer. The nature of this porous outer layer was found to depend on the nature of the electrode material and the presence of phosphate anions in the saline-buffered solution. The porous layers formed on Ti–45Ni and Ti–6Al–4V in the presence of phosphate anions had low resistances typically between 10 and 70 Ω cm2. Much higher porous layer resistances were recorded for Ti and also for Ti–45Ni and Ti–6Al–4V in the absence of the phosphate anions.

    Item Type: Article
    Keywords: Implant; Corrosion; Pitting; Impedance spectroscopy;
    Academic Unit: Faculty of Science and Engineering > Chemistry
    Item ID: 7940
    Identification Number:
    Depositing User: Dr. Carmel Breslin
    Date Deposited: 17 Feb 2017 17:07
    Journal or Publication Title: Biomaterials
    Publisher: Elsevier
    Refereed: Yes
    Funders: Enterprise Ireland (EI)
    Use Licence: This item is available under a Creative Commons Attribution Non Commercial Share Alike Licence (CC BY-NC-SA). Details of this licence are available here

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