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    On the closed-loop control of an argon plasma process

    Iordanov, Petar and Keville, Bernard and Ringwood, John and Doherty, Sean and Faulkner, Ronan (2006) On the closed-loop control of an argon plasma process. In: Irish Signals and Systems Conference (ISSC 2006), June 2006, Dublin.

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    Closed-loop control of a plasma process for etching ap- plications is discussed in this study. Plasma processes are highly nonlinear systems that typically feature complex chemical and phys- ical reactions. A laboratory-based plasma reactor is presented in this work, and issues concerning its closed-loop control are discussed. A PID controller for the experimental plasma process is developed and its performance is analysed. The need for a more advance control methodology is studied and some appropriate control structures are proposed. Finally, a description of the practical implementation of real-time multivariable closed-loop control for the studied plasma re- actor is presented.

    Item Type: Conference or Workshop Item (Paper)
    Additional Information: This work has been undertaken within the Plas- MAC project, a joint collaboration between Na- tional University of Ireland at Maynooth and Dublin City University (DCU), and supported by Science Foundation Ireland (SFI). The authors would like to thank Felipe Soberon (Invent Cen- tre, DCU). His efforts in building the experimental setup for the plasma reactor have been of immense help.
    Keywords: semiconductor manufacturing; plasma process; process control; real-time control;
    Academic Unit: Faculty of Science and Engineering > Electronic Engineering
    Item ID: 9498
    Depositing User: Professor John Ringwood
    Date Deposited: 22 May 2018 16:24
    Refereed: Yes
    Funders: Science Foundation Ireland (SFI)
      Use Licence: This item is available under a Creative Commons Attribution Non Commercial Share Alike Licence (CC BY-NC-SA). Details of this licence are available here

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