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Iordanov, Petar and Ringwood, John and Doherty, Sean (2005) Nonlinear Control Design for a Plasma Process. 44th IEEE Conference on Decision and Control and the European Control Conference, 2005. pp. 2380-2385.
Iordanov, Petar and Ringwood, John and Doherty, Sean (2005) Control problem classification for a plasma process. Proceedings of the 16th IFAC World Congress, Prague.
Ringwood, John and Devitt, Frank and Doherty, Sean and Farrell, Ronan and Lawlor, Bob and McLoone, Sean F. and McLoone, Seamus and Rogers, Alan and Villing, Rudi and Ward, Tomas E. (2005) A resource management tool for implementing strategic direction in an academic department. Journal of Higher Education Policy and Management, 27 (2). pp. 273-283.
Doherty, Sean and Gomm, J.B. and Williams, D. (1997) Experiment design considerations for non-linear system identification using neural networks. Computers & Chemical Engineering, 21 (3). pp. 327-346. ISSN 0098-1354
Gomm, J.B. and Williams, D. and Evans, J.T. and Doherty, Sean and Lisboa, P.J.G. (1996) Enhancing the non-linear modelling capabilities of MLP neural networks using spread encoding. Fuzzy Sets and Systems, 79 (1). pp. 113-126. ISSN 0165-0114
Gomm, J.B. and Doherty, Sean and Williams, D. (1996) Control of pH in-line using a neural predictive strategy. In: UKACC International Conference on Control '96 (Conf. Publ. No. 427). IET, pp. 1058-1063. ISBN 0852966687
Doherty, Sean and Gomm, J.B. and Williams, D. and Eardley, D.C. (1994) Design issues in applying neural networks to model highly non-linear processes. In: 1994 International Conference on Control - Control '94. IET, pp. 1478-1483. ISBN 0852966105
Iordanov, Petar and Keville, Bernard and Ringwood, John and Doherty, Sean and Faulkner, Ronan (2006) On the closed-loop control of an argon plasma process. In: Irish Signals and Systems Conference (ISSC 2006), June 2006, Dublin.
Keville, Bernard and Iordanov, Petar and Ringwood, John and Doherty, Sean and Faulkner, Ronan and Soberon, Felipe and McCarter, Angus (2006) On the modelling and closed loop control of an inductively coupled plasma chamber. In: IFAC Workshop on Advanced Process Control for Semiconductor Manufacturing, December 2006, Singapore.
