Article

Iordanov, Petar, Ringwood, John and Doherty, Sean (2005) Nonlinear Control Design for a Plasma Process. 44th IEEE Conference on Decision and Control and the European Control Conference, 2005. pp. 2380-2385.

Iordanov, Petar, Ringwood, John and Doherty, Sean (2005) Control problem classification for a plasma process. Proceedings of the 16th IFAC World Congress, Prague.

Ringwood, John, Devitt, Frank, Doherty, Sean, Farrell, Ronan, Lawlor, Bob, McLoone, Sean F., McLoone, Seamus, Rogers, Alan, Villing, Rudi and Ward, Tomas E. (2005) A resource management tool for implementing strategic direction in an academic department. Journal of Higher Education Policy and Management, 27 (2). pp. 273-283.

Doherty, Sean, Gomm, J.B. and Williams, D. (1997) Experiment design considerations for non-linear system identification using neural networks. Computers & Chemical Engineering, 21 (3). pp. 327-346. ISSN 0098-1354

Gomm, J.B., Williams, D., Evans, J.T., Doherty, Sean and Lisboa, P.J.G. (1996) Enhancing the non-linear modelling capabilities of MLP neural networks using spread encoding. Fuzzy Sets and Systems, 79 (1). pp. 113-126. ISSN 0165-0114

Book Section

Gomm, J.B., Doherty, Sean and Williams, D. (1996) Control of pH in-line using a neural predictive strategy. In: UKACC International Conference on Control '96 (Conf. Publ. No. 427). IET, pp. 1058-1063. ISBN 0852966687

Doherty, Sean, Gomm, J.B., Williams, D. and Eardley, D.C. (1994) Design issues in applying neural networks to model highly non-linear processes. In: 1994 International Conference on Control - Control '94. IET, pp. 1478-1483. ISBN 0852966105

Conference or Workshop Item

Iordanov, Petar, Keville, Bernard, Ringwood, John, Doherty, Sean and Faulkner, Ronan (2006) On the closed-loop control of an argon plasma process. In: Irish Signals and Systems Conference (ISSC 2006), June 2006, Dublin.

Keville, Bernard, Iordanov, Petar, Ringwood, John, Doherty, Sean, Faulkner, Ronan, Soberon, Felipe and McCarter, Angus (2006) On the modelling and closed loop control of an inductively coupled plasma chamber. In: IFAC Workshop on Advanced Process Control for Semiconductor Manufacturing, December 2006, Singapore.