Article

Lynn, Shane, Ringwood, John and MacGearailt, Niall (2012) Global and Local Virtual Metrology Models for a Plasma Etch Process. IEEE Transactions on Semiconductor Manufacturing, 25 (1). pp. 94-103. ISSN 0894-6507

Lynn, Shane, MacGearailt, Niall and Ringwood, John (2012) Real-time virtual metrology and control for plasma etch. Journal of Process Control, 22. pp. 666-676. ISSN 0959-1524

Lynn, Shane, MacGearailt, Niall and Ringwood, John (2011) Real-time Virtual Metrology and Control of Plasma Electron Density in an Industrial Plasma Etch Chamber. Proceedings of 18th IFAC World Congress. pp. 12060-12065. ISSN 1474-6670

Ringwood, John, Lynn, Shane, Bacelli, Giorgio, Ma, Beibei Ma, Ragnoli, Emanuele and McLoone, Sean F. (2010) Estimation and Control in Semiconductor Etch: Practice and Possibilities. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 23 (1). ISSN 0894-6507

Lynn, Shane, Ringwood, John, Ragnoli, Emanuele, McLoone, Sean F. and MacGearailt, Niall (2009) Virtual Metrology for Plasma Etch using Tool Variables. Advanced Semiconductor Manufacturing Conference, 2009. . pp. 143-148. ISSN 1078-8743

Lynn, Shane, Ringwood, John and Del Valle Gamboa, Juan Ignacio (2008) State Estimation for the VASIMR Plasma Engine. Signals and Systems Conference, 2008. . pp. 24-29. ISSN 0537-9989

Conference or Workshop Item

Lynn, Shane, Ringwood, John and MacGearailt, Niall (2012) Gaussian Process Regression for Virtual Metrology of Plasma Etch. In: Irish Signals and Systems Conference 2010, June, 2010, Cork.

Lynn, Shane, Ringwood, John and MacGearailt, Niall (2010) Weighted windowed PLS models for virtual metrology of an industrial plasma etch process. In: IEEE International Conference on Industrial Technology (ICIT), March, 2010, Chile.

Thesis

Lynn, Shane (2011) Virtual metrology for plasma etch processes. PhD thesis, National University of Ireland Maynooth.