Ringwood, John and Lynn, Shane and Bacelli, Giorgio and Ma, Beibei Ma and Ragnoli, Emanuele and McLoone, Sean F. (2010) Estimation and Control in Semiconductor Etch: Practice and Possibilities. IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 23 (1). ISSN 0894-6507

Lynn, Shane and Ringwood, John and Ragnoli, Emanuele and McLoone, Sean F. and MacGearailt, Niall (2009) Virtual Metrology for Plasma Etch using Tool Variables. Advanced Semiconductor Manufacturing Conference, 2009. . pp. 143-148. ISSN 1078-8743

Ragnoli, Emanuele and McLoone, Seamus and Ringwood, John and Macgerailt, N. (2008) Matrix Factorisation Techniques for Endpoint Detection in Plasma Etching. In: IEEE/SEMI Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE, pp. 156-161. ISBN 9781424419647

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