2012

Lynn, Shane, Ringwood, John and MacGearailt, Niall (2012) Gaussian Process Regression for Virtual Metrology of Plasma Etch. In: Irish Signals and Systems Conference 2010, June, 2010, Cork.

Lynn, Shane, Ringwood, John and MacGearailt, Niall (2012) Global and Local Virtual Metrology Models for a Plasma Etch Process. IEEE Transactions on Semiconductor Manufacturing, 25 (1). pp. 94-103. ISSN 0894-6507

Lynn, Shane, MacGearailt, Niall and Ringwood, John (2012) Real-time virtual metrology and control for plasma etch. Journal of Process Control, 22. pp. 666-676. ISSN 0959-1524

2011

Lynn, Shane, MacGearailt, Niall and Ringwood, John (2011) Real-time Virtual Metrology and Control of Plasma Electron Density in an Industrial Plasma Etch Chamber. Proceedings of 18th IFAC World Congress. pp. 12060-12065. ISSN 1474-6670

2010

Ma, Beibei, McLoone, Sean F., Ringwood, John and MacGearailt, Niall (2010) An Analysis of Noise on Optical Emission Spectroscopy Measurements. In: Irish Signals and Systems Conference 2010, June, 2010, Cork.

Lynn, Shane, Ringwood, John and MacGearailt, Niall (2010) Weighted windowed PLS models for virtual metrology of an industrial plasma etch process. In: IEEE International Conference on Industrial Technology (ICIT), March, 2010, Chile.

2009

Butler, Shane, Ringwood, John and MacGearailt, Niall (2009) Prediction of Vacuum Pump Degradation in Semiconductor Processing. In: SAFEPROCESS'09, 7th IFAC Symposium on Fault Detection, Supervision and Safety of Technical Processes, June 30 - July 3 2009, Barcelona.

Lynn, Shane, Ringwood, John, Ragnoli, Emanuele, McLoone, Sean F. and MacGearailt, Niall (2009) Virtual Metrology for Plasma Etch using Tool Variables. Advanced Semiconductor Manufacturing Conference, 2009. . pp. 143-148. ISSN 1078-8743